Deskripsi Kepakaran
Teknologi dan aplikasi plasma low-temperature untuk biomaterial/biomedis (example: implan tulang) Training dan active user: 1. Inverter plasma (Osaka University) 2. Plasma Nitriding (PRTA-BRIN) 3. RF magnetron sputtering plasma single target (nano cleanroom-Osaka University) 4. Thermal atomic layer deposition & Plasma enhanced atomic layer deposition (PEALD) (Central European Institute of Technology(CEITEC), Czech Republic -standard nano cleanroom ISO 5) 5. RF/DC/pulse magnetron sputtering plasma multiple targets (total 8 target) (Central European Institute of Technology(CEITEC), Czech Republic -standard nano cleanroom ISO 5) 6. X-ray Photoelectron Spectroscopy Axis Supra (KRATOS-XPS) untuk analisis permukaan dan metode depth profiling/etching analysis menggunakan Ar plasma(Central European Institute of Technology(CEITEC), Czech Republic -standard nano cleanroom ISO 8) 7. X-ray photoelectron spectroscopy (XPS) JPS-9010MC (JEOL) untuk analisis permukaan dan metode depth profiling/etching analysis menggunakan Ar plasma (Osaka University) 8. Scanning Probe Microscope Bruker Dimension Icon (ICON-SPM) (Central European Institute of Technology(CEITEC), Czech Republic -standard nano cleanroom ISO 8) 9. Focused Ion Beam/Scanning Electron Microscope TESCAN LYRA3 (LYRA) (Central European Institute of Technology(CEITEC), Czech Republic -standard nano cleanroom ISO 8) 10. Field Emission Scanning Electron Microscope System with Elemental Analyzer (EDS) JEOL JSM-F100 (Osaka University)